Nanlin Wang
Nanlin Wang obtained his B.S. degree in materials Science and Engineering from Central South China University in Changsha, China. He obtained an M.S. in Materials Science and Engineering from Iowa State in 2003 and Ph. D. in EE in 2006 with Professor Dalal. Nanlin had been studying the influence of chemical annealing on amorphous Si films and devices. Chemical annealing, in principle, is capable of changing the structure and therefore, H bonding, of thin films during growth. Nanlin showed that as the duration of anneal cycle increased, the amorphous film turned nanocrystalline, a very surprising result. He also found that by controlling chemical annealing, one can control the stability of a-Si:H photovoltaic devices, with significant increases in stability under certain conditions.
Back to Current Graduate Students