Fee Structure

Fee For Service

1. We charge a low hourly rate for each tool. 

2. $300 per semester (Spring, Fall or Summer) basic charge that covers the following items:

  • Commonly used supplies

Tweezers, cleanroom wipes, gloves, glassware. 

  • Commonly used materials

Photoresist AZ5214, developer, isopropanol, acetone, and DI water  

 

Aluminum, chromium, titanium, and nickel e-beam evaporation target material

  • Electrical characterization

Probe stations, semiconductor analyzers, four-probe resistance, oscilloscope, function generator, multimeter, LCR meter, and network analyzer.

  • Optical characterization

Surface profiler, Filmetrics (thin film thickness measurement), optical microscope, and stereo microscopes

  • Basic fabrication and sample preparation

Oxygen plasma treatment, spin coaters, various ovens, hotplates, mixers, analytical balance, wet chemical hoods

  • Storage cabinets inside the facility
  • Technical advice from our staff for designing microfabrication process and measurement setup

If you would like to have our staff run your examples, there will be a staff labor charge on top of the rate listed in the table below.

Charge rates for MRC equipment ($ per hour) (all prices subject to change)

Instrument 

ISU intramural user rates

  

Microfabrication Tools

MJB3 Mask Aligner

27.5

  

MJB4 Mask Aligner

27.5

  

MA6 Mask Aligner

27.5

  

Nanoscribe 3D Printer 

90

  

Deep Reactive Ion Etcher

70

  

Reactive Ion Etcher

70

  

Denton E-beam evaporator

66

  

Temescal E-­beam evaporator

58

  

Sputtering

58

  

Atomic Layer Deposition

58

  

E-beam Lithography 

58

  

Rapid Thermal Process

20

  

Wire Bonder

20

  

Characterization Tools

Varian/Cary UV/VIS Spectrophotometer

50

  

Atomic Force Microscope 

20

  

Raman spectrometer*

20

  

FTIR spectrometer*

20

  

Scanning electron microscope (Raith)

40

 

 

Training session

Fee for training sessions is $50 per hour. Training sessions must be performed by Facility staff prior to facility and equipment access.