Raith e-beam lithography

The Raith e-LiNE is an electron beam (E-beam) lithography system used for nanoscale fabrication. This e-beam system is also equipped with thermal field emission filament technology and a laser-interferometer controlled stage. Thus, it can be used for SEM imaging of crucial engineering technologies.


Capabilities and specifications:

  • 0.5 – 30kV accelerating voltage
  • E-beam lithography has an incredibly high resolution
  • write small features from 40 nm up to 100 mm in diameter


Contact: Dr. Qingfeng Xing or Dr. Liang Dong