Rapid Thermal Process

The SSI Solaris 150 Rapid Thermal Process (RTP) is a rapid thermal processing system, allowing the annealing of the samples in temperature range from 20 to 1200 °C. RTP employs a UV/ Ozone generator to heat the substrates at ultrafast heating rates and ramps at stabilized temperature using a PID controllers.


Capabilities and specifications:

  • Controlled atmosphere: N2
  • Temperature range: 20 to 1200 °C


Contact: Dr. Qingfeng Xing or Dr. Liang Dong